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Showing items 1-10 of 17 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
國立成功大學 |
2008-09-01 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
國立高雄大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
國立成功大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
國立高雄大學 |
2007-04-30 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
國立成功大學 |
2007-04 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
國立成功大學 |
2007-04 |
Extra bonus on transistor optimization with stress enhanced notched-gate technology for sub-90 nm complementary metal oxide semiconductor field effect transistor
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Lin, Chien-Ting; Fang, Yean-Kuen; Lai, Chieh-Ming; Yeh, Wen-Kuan; Hsu, Che-Hua; Cheng, Li-Wei; Huang, Yao-Tsung; Ma, Guang Hwa |
國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
國立高雄大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting; Chou, T.H. |
國立成功大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, C. T.; Chou, T. H. |
Showing items 1-10 of 17 (2 Page(s) Totally) 1 2 > >> View [10|25|50] records per page
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